Semiconductor device and manufacturing method thereof

摘要

A semiconductor device includes a substrate that has a surface. The semiconductor further includes a fin disposed on the surface and including a semiconductor member. The semiconductor further includes a spacer disposed on the surface, having a type of stress, and overlapping the semiconductor member in a direction parallel to the surface. A thickness of the spacer in a direction perpendicular to the surface is less than a height of the semiconductor member in the direction perpendicular to the surface.

主权项

1. A method for manufacturing a semiconductor device, the method comprising:
providing a first fin and a second fin on a substrate; disposing a first-type stress material on the substrate such that the first-type stress material covers the first fin and the second fin, a first portion of the first-type stress material corresponding to the first fin, a second portion of the first-type stress material corresponding to the second fin; disposing a first resist pattern over the first-type stress material such that the first resist pattern covers the first portion of the first-type stress material without covering the second portion of the first-type stress material; using the first resist pattern as a mask to remove the second portion of the first-type stress material; removing the first resist pattern; disposing a second-type stress material over the first portion of the first-type stress material and over the second fin, the second-type stress material being different from the first-type stress material, a first portion of the second-type stress material corresponding to the first fin, a second portion of the second-type stress material corresponding to the second fin; disposing a second resist pattern over the second-type stress material such that the first resist pattern covers the second portion of the second-type stress material without covering the first portion of the first-type stress material; using the second resist pattern as a mask to remove the first portion of the second-type stress material; etching the first portion of the first-type stress material to form a first spacer at a first corner, the first corner being formed by the substrate and the first fin; and etching the second portion of the second-type stress material to form a second spacer at a second corner, the second corner being formed by the substrate and the second fin.