发明名称 Semiconductor die singulation method
摘要 In one embodiment, semiconductor die are singulated from a semiconductor wafer by forming trenches along singulation lines and initiating a cracks from within the trenches, which propagate through the semiconductor wafer in a more controlled manner.
申请公布号 US8871613(B2) 申请公布日期 2014.10.28
申请号 US201213526140 申请日期 2012.06.18
申请人 Semiconductor Components Industries, LLC 发明人 Seddon Michael J.
分类号 H01L21/78;H01L21/822 主分类号 H01L21/78
代理机构 代理人 Jackson Kevin B.
主权项 1. A method of singulating semiconductor die from a semiconductor wafer comprising: providing a semiconductor wafer having a plurality of semiconductor die formed on the semiconductor wafer and separated by singulation lines, wherein the singulation lines are portions of the semiconductor wafer; forming trenches within the singulation lines; locally heating lower surfaces of the trenches to form localized stresses within the trenches without forming molten matter; and cooling the semiconductor wafer to propagate cracks generally downward and completely through the semiconductor wafer using the trenches to control crack propagation.
地址 Phoenix AZ US