发明名称 |
Semiconductor die singulation method |
摘要 |
In one embodiment, semiconductor die are singulated from a semiconductor wafer by forming trenches along singulation lines and initiating a cracks from within the trenches, which propagate through the semiconductor wafer in a more controlled manner. |
申请公布号 |
US8871613(B2) |
申请公布日期 |
2014.10.28 |
申请号 |
US201213526140 |
申请日期 |
2012.06.18 |
申请人 |
Semiconductor Components Industries, LLC |
发明人 |
Seddon Michael J. |
分类号 |
H01L21/78;H01L21/822 |
主分类号 |
H01L21/78 |
代理机构 |
|
代理人 |
Jackson Kevin B. |
主权项 |
1. A method of singulating semiconductor die from a semiconductor wafer comprising:
providing a semiconductor wafer having a plurality of semiconductor die formed on the semiconductor wafer and separated by singulation lines, wherein the singulation lines are portions of the semiconductor wafer; forming trenches within the singulation lines; locally heating lower surfaces of the trenches to form localized stresses within the trenches without forming molten matter; and cooling the semiconductor wafer to propagate cracks generally downward and completely through the semiconductor wafer using the trenches to control crack propagation. |
地址 |
Phoenix AZ US |