发明名称 |
Packages and method of forming the same |
摘要 |
A method includes forming a dielectric layer over a substrate, forming an interconnect structure over the dielectric layer, and bonding a die to the interconnect structure. The substrate is then removed, and the dielectric layer is patterned. Connectors are formed at a surface of the dielectric layer, wherein the connectors are electrically coupled to the die. |
申请公布号 |
US8871568(B2) |
申请公布日期 |
2014.10.28 |
申请号 |
US201213345485 |
申请日期 |
2012.01.06 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Shih Ying-Ching;Lu Szu Wei;Lin Jing-Cheng |
分类号 |
H01L21/58;H01L23/485;H01L21/78 |
主分类号 |
H01L21/58 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method comprising:
forming a first dielectric layer over a substrate; forming an interconnect structure over the first dielectric layer, wherein the interconnect structure comprises redistribution lines in at least one second dielectric layer; bonding a die to the interconnect structure; performing a pre-cut on the interconnect structure to form a trench, wherein the trench extends into the interconnect structure; after the performing the pre-cut, molding a polymer on the die, wherein the polymer is in contact with edges of the die; removing the substrate to reveal the first dielectric layer; after the removing the substrate, patterning the first dielectric layer; and forming connectors at a surface of the first dielectric layer, wherein the connectors are electrically coupled to the die. |
地址 |
Hsin-Chu TW |