发明名称 Packages and method of forming the same
摘要 A method includes forming a dielectric layer over a substrate, forming an interconnect structure over the dielectric layer, and bonding a die to the interconnect structure. The substrate is then removed, and the dielectric layer is patterned. Connectors are formed at a surface of the dielectric layer, wherein the connectors are electrically coupled to the die.
申请公布号 US8871568(B2) 申请公布日期 2014.10.28
申请号 US201213345485 申请日期 2012.01.06
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Shih Ying-Ching;Lu Szu Wei;Lin Jing-Cheng
分类号 H01L21/58;H01L23/485;H01L21/78 主分类号 H01L21/58
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A method comprising: forming a first dielectric layer over a substrate; forming an interconnect structure over the first dielectric layer, wherein the interconnect structure comprises redistribution lines in at least one second dielectric layer; bonding a die to the interconnect structure; performing a pre-cut on the interconnect structure to form a trench, wherein the trench extends into the interconnect structure; after the performing the pre-cut, molding a polymer on the die, wherein the polymer is in contact with edges of the die; removing the substrate to reveal the first dielectric layer; after the removing the substrate, patterning the first dielectric layer; and forming connectors at a surface of the first dielectric layer, wherein the connectors are electrically coupled to the die.
地址 Hsin-Chu TW