Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same

摘要

A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer.

主权项

1. A photoresist composition for fabricating a probe array comprising:
a photoacid generator having an onium salt comprising a sulfonium salt, which comprises a sulfonium salt cation portion represented by the formula (1) and a sulfonium salt anion portion represented by formula (2): wherein in formula (1), each A, B, and C is one of a hydroxyl group, a cyclo group or a cycloalkyl group, and in the formula (2), n is an integer from 1to 3, and X comprises a C3-C10 cycloalkyl group, an adamantyl group, or a cyclo heptane group comprising oxygen; and an i-line reactive sensitizer including butyl benzyl phthalate.