发明名称 Glass substrate for display cover glass and its production process
摘要 To provide a glass substrate for a display cover glass not only having excellent strength and antibacterial properties but also having a high transparency and a high visible transmittance suitable as a cover glass for a display device. A glass substrate for a display cover glass, which comprises a surface compressive stress layer and an antibacterial substance-containing layer formed on the glass substrate surface, characterized by having a ratio (T1/T2) of the transmittance T1 at a wavelength of 428 nm to the transmittance T2 at a wavelength of 650 nm of the glass substrate of at least 0.95, and a transmittance at a wavelength of 428 nm of at least 86% when the thickness of the glass substrate is from 0.1 to 3.0 mm.
申请公布号 US8869558(B2) 申请公布日期 2014.10.28
申请号 US201213466257 申请日期 2012.05.08
申请人 Asahi Glass Company, Limited 发明人 Yamamoto Hiroyuki;Matsuo Yusaku
分类号 C03C21/00;C03C4/00;C03C3/087;C03C3/093;G02F1/1333 主分类号 C03C21/00
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A process for producing a glass substrate, comprising: chemically tempering a glass substrate in a molten salt comprising at least KNO3 to provide a chemically tempered glass substrate, cleaning the chemically tempered glass substrate to provide a cleaned glass substrate, forming a silver film on the surface of the cleaned glass substrate to provide a glass substrate having a silver film formed thereon, subjecting the glass substrate having the silver film formed thereon to heat treatment to diffuse silver ions from the glass substrate surface to the inside, and after said heat treatment washing and removing silver remaining on the glass substrate surface which was not diffused in the inside of the glass substrate, wherein the glass substrate produced has a silver amount of from 0.2 to 100 μg/cm2 at a depth of 40 μm from the glass substrate surface, and wherein the glass substrate produced comprises a surface compressive stress layer, and has a ratio (T1/T2) of the transmittance T1 at a wavelength of 428 nm to the transmittance T2 at a wavelength of 650 nm of at least 0.95, and a transmittance at a wavelength of 428 nm of at least 86% when the thickness of the glass substrate is from 0.1 to 3.0 mm.
地址 Tokyo JP