发明名称 |
Field-effect transistor and method for manufacturing the same |
摘要 |
A field-effect transistor includes a semiconductor layer containing carbon nanomaterials; a first electrode and a second electrode formed in contact with the semiconductor layer; a third electrode for controlling current flowing between the first electrode and the second electrode; and an insulating layer formed between the semiconductor layer and the third electrode. The insulating layer contains an aromatic polyamide comprising a substituent containing 1 to 20 carbon atoms. |
申请公布号 |
US8872162(B2) |
申请公布日期 |
2014.10.28 |
申请号 |
US201113583549 |
申请日期 |
2011.03.09 |
申请人 |
NEC Corporation |
发明人 |
Endoh Hiroyuki |
分类号 |
H01L29/06;B82Y10/00;H01L51/05;H01L51/00 |
主分类号 |
H01L29/06 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. A field-effect transistor, comprising:
a semiconductor layer including a carbon nanomaterial; a first electrode and second electrode formed in contact with said semiconductor layer; a third electrode to control current that flows between said first electrode and said second electrode; and an insulating layer formed between said semiconductor layer and said third electrode; wherein said insulating layer includes a high molecular compound shown in Chem. 1; and at least one of R1 to R8 in said high molecular compound is a substituent including 1 carbon atom to 20 carbon atoms, and the remaining substituent(s) is/are hydrogen |
地址 |
Tokyo JP |