发明名称 | Deposition and reduction of mixed metal oxide thin films | ||
摘要 | In one aspect, methods of forming mixed metal thin films comprising at least two different metals are provided. In some embodiments, a mixed metal oxide thin film is formed by atomic layer deposition and subsequently reduced to a mixed metal thin film. Reduction may take place, for example, in a hydrogen atmosphere. The presence of two or more metals in the mixed metal oxide allows for reduction at a lower reduction temperature than the reduction temperature of the individual oxides of the metals in the mixed metal oxide film. | ||
申请公布号 | US8871617(B2) | 申请公布日期 | 2014.10.28 |
申请号 | US201213416921 | 申请日期 | 2012.03.09 |
申请人 | ASM IP Holding B.V. | 发明人 | Pore Viljami J.;Tois Eva |
分类号 | H01L21/20;H01L21/285;C23C16/40;C23C16/06;C23C16/455;H01L29/78;H01L29/66;H01L29/49;H01L29/45 | 主分类号 | H01L21/20 |
代理机构 | Knobbe, Martens Olson & Bear, LLP | 代理人 | Knobbe, Martens Olson & Bear, LLP |
主权项 | 1. A method for forming a metallic film comprising two different metals on a substrate in a reaction space, the method comprising: depositing a mixed metal oxide comprising a first metal and a second metal on the substrate, wherein the first metal is different from the second metal and the mixed metal oxide comprises a greater concentration of the first metal than the second metal and wherein the mixed metal oxide film is not a film in which distinct and separate layers of metal oxides are observable; and reducing the mixed metal oxide by heating the substrate in a hydrogen atmosphere, wherein the first metal is selected from the group consisting of Ni, Fe, Co, Cu, Ag, Cr, V, Mn, Zn, Sn, Pb, Bi, In and Cd; and wherein the second metal is selected from the group consisting of Pt, Ni, Pd, Rh, Ru, and Co. | ||
地址 | NL |