Reference library generation method for methods of inspection, inspection apparatus and lithographic apparatus

摘要

A library of model diffraction patterns is generated where each represents a diffraction pattern expected from a target structure defined by a set of parameters and having a first part and a second part, the first part comprising a scattering object. The target structure is defined. The scattering effect of the first part of the target structure is defined by a set of first part parameters, for a plurality of different sets of first part parameters. The scattering effect of the second part of the target structure defined by a set of second part parameters, for a plurality of different sets of second part parameters. The results of the calculations is used to calculate the model diffraction patterns.

主权项

1. A method of generating a library of model diffraction patterns, each representing a diffraction pattern expected from a target structure defined by a set of parameters and having a first part and a second part, the first part comprising a scattering object, the method comprising:
calculating, using a processing unit, a first scattering effect of the first part of the target structure defined by a set of first part parameters for a plurality of different sets of first part parameters; calculating, using the processing unit, a second scattering effect of the second part of the target structure defined by a set of second part parameters for a plurality of different sets of second part parameters; and combining, using a processing unit, results of the calculatings to calculate model diffraction patterns, wherein the results of the calculating a first scattering effect are stored as they are calculated, these stored results being subsequently combined with the results of the calculating a second scattering effect as the latter are calculated.