Pattern measuring apparatus

摘要

An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

主权项

1. A pattern measuring apparatus, comprising:
an arithmetical unit configured to perform, by way of a programmed processor:
determining a pattern size by using a signal to be obtained based on scanning of a charged particle beam emitted from a charged particle source; and a beam tilting deflector for irradiating the charged particle beam while tilting this beam with respect to an ideal light axis thereof, wherein the arithmetical unit is configured to perform, by way of the programmed processor:
specifying a kind of a pattern formed on a sample based on a signal obtained by obliquely scanning the beam in an area of the sample being different from an area used to obtain the pattern size.