发明名称 Semiconductor device
摘要 According to one embodiment, a semiconductor device includes: a first region including: a first semiconductor layer; a first semiconductor region; a second semiconductor region; a third semiconductor region having higher impurity concentration than the first semiconductor region; a first electrode; a second electrode; an insulating film; a third electrode; a fourth electrode, a second region including a pad electrode, and the third region including: the first semiconductor layer; the first semiconductor region; a third semiconductor region; the first electrode; the second electrode; and a first insulating layer.
申请公布号 US8872257(B1) 申请公布日期 2014.10.28
申请号 US201314015145 申请日期 2013.08.30
申请人 Kabushiki Kaisha Toshiba 发明人 Matsuoka Takeru;Saito Yasuhito;Kamiyama Seiichiro
分类号 H01L29/76;H01L29/94;H01L29/78 主分类号 H01L29/76
代理机构 White & Case LLP 代理人 White & Case LLP
主权项 1. A semiconductor device comprising: a first region; a second region; and a third region provided between the first region and the second region, the first region including: a first semiconductor layer of a first conductivity type;a first semiconductor region of a second conductivity type provided on the first semiconductor layer;a second semiconductor region of the first conductivity type provided on the first semiconductor region;a third semiconductor region of the second conductivity type being in contact with the first semiconductor region, and the third semiconductor region having higher impurity concentration than the first semiconductor region;a first electrode electrically connected to the second semiconductor region and the third semiconductor region;a second electrode electrically connected to the first semiconductor layer;an insulating film extending from a surface of the first semiconductor region into the first semiconductor layer;a third electrode in contact with the first semiconductor region via the insulating film;a fourth electrode in contact with the first semiconductor layer and the third electrode via the insulating film, the second region including a pad electrode electrically connected to the third electrode above the first semiconductor layer, and the third region including: the first semiconductor layer;the first semiconductor region provided on the first semiconductor layer;the third semiconductor region in contact with the first semiconductor region;the first electrode electrically connected to the third semiconductor region;the second electrode electrically connected to the first semiconductor layer; anda first insulating layer extending from a position of the third semiconductor region to a position of the first semiconductor layer.
地址 Tokyo JP