发明名称 LOW ENERGY ION MILLING OR DEPOSITION
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of producing a thin sample for a transmission electron microscope by ion milling, capable of reducing a thickness of an amorphous layer generated by processing damage and injection to the sample, of metal ions (e.g., Ga ions) used for an ion beam.SOLUTION: A sample 200 is arranged in parallel to an electric charge particle beam (an electron beam or an ion beam) 206. Gas jet flow (e.g., a rare gas) 207 is led from a metal capillary 201 to the sample. A voltage is applied to between the sample and the metal capillary by a power supply 208. The electric charge particle beam is led so as to cross the gas jet flow to ionize the gas jet flow. The sample is irradiated with the generated ions by a low electric field generated between the sample and the metal capillary, and milled at a low energy.</p>
申请公布号 JP2014203827(A) 申请公布日期 2014.10.27
申请号 JP20140075878 申请日期 2014.04.02
申请人 FEI CO 发明人 JOHANNES JACOBUS LAMBERTUS MULDERS;REMCO THEODORUS JOHANNES PETRUS GEURTS;PETRUS HUBERTUS FRANCISCUS TROMPENAARS;ERIC GERARDUS THEODORE BOSS
分类号 H01J37/305;H01J37/317 主分类号 H01J37/305
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