| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a technique advantageous in making exposure processing of an omitted shot area efficient.SOLUTION: An exposure method comprises subjecting a photo-mask and a substrate to synchronous scanning by using a scanning exposure device, and subjecting the substrate to scanning exposure for each shot area by means of slit light formed in a slit shape. The exposure method comprises a step of, when an omission shot area that uses the effective exposure area of the substrate as part of an outer edge is subjected to scanning exposure from the inside of the effective exposure area toward outside, starting the speed reduction of the synchronous scanning while emitting exposure light to the substrate before all the slit light travels outside the effective exposure area.</p> |
