发明名称 SYSTEM AND METHOD FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES BY THE IMPLANTATION OF CARBON CLUSTERS
摘要 <p>A method of implanting ions is disclosed which comprises the steps of: (a) producing a volume of gas phase molecules of material of the form C n H x wherein n and x are integers, and n ‰¥ 2, and x ‰¥ 0; (b) ionizing the C n H x molecules to form C n H y + or C n H y - , wherein y is an integer such that y>0; and (c) accelerating the ionized molecules by an electric field into a target.</p>
申请公布号 KR101455564(B1) 申请公布日期 2014.10.27
申请号 KR20137030984 申请日期 2006.12.06
申请人 发明人
分类号 H01L21/265;H01L21/336 主分类号 H01L21/265
代理机构 代理人
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