| 摘要 |
A method for manufacturing a solar cell using a plasma surface process is provided to remove a dead layer from an emitter layer and a surface defect by processing a front surface and a back surface of the solar cell substrate with the plasma after forming the emitter layer. A solar cell substrate(201) doped with a first conductive type impurity is prepared. The front surface of the solar cell substrate is processed with the plasma for reducing the reflectance of the sunlight. A second conductive type impurity opposite to the first conductive type impurity is implanted to the front surface of the solar cell for forming an emitter layer(202). A dead layer is reduced by processing the front surface of the solar cell substrate with the plasma. A second conductive type impurity implantation layer(207) is removed and the rear surface is planarized when forming the emitter layer in the rear surface by processing the rear surface of the solar cell substrate. A reflection preventing layer is formed in the front surface of the solar cell substrate. A front electrode is contacted with the emitter layer by passing through the reflection preventing layer. A rear electrode is contacted with the rear surface of the solar cell substrate. A BSF(Back Surface Field) is formed in the rear surface in contact with the rear electrode. |
