发明名称 WAFER TRANSFER MECHANISM AND WAFER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To radiate ultraviolet ray to a protective tape while sucking well even with a minute chip after DBG.SOLUTION: A wafer transfer mechanism 1 transfers a wafer W in which a device region 23, in which a plurality of devices 24 are formed by being divided by a plurality of scheduled division lines, and an outer periphery margin region 22 which encloses the device region 23 are formed on a surface 21. It includes at least a transfer pad 10 which has a shape equivalent to a profile of the wafer W and abuts on a rear surface 26 of the wafer W for sucking and holding, and an arm 5 for moving the transfer pad 10. The transfer pad 10 includes a ring-like sucking/holding part 12 which sucks and holds the outer periphery margin region 22 of the wafer W, and a device region abutment part 13 which is enclosed with the sucking/holding part 12 and abuts on the device region 23 of the wafer W.
申请公布号 JP2014204089(A) 申请公布日期 2014.10.27
申请号 JP20130081637 申请日期 2013.04.09
申请人 DISCO ABRASIVE SYST LTD 发明人 NISHIDA DAISUKE;OHINO KOICHI;KOSHIMIZU HIDEKI
分类号 H01L21/677;H01L21/301;H01L21/304 主分类号 H01L21/677
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