| 摘要 |
PROBLEM TO BE SOLVED: To provide an abrasive material containing silicon oxide particles used for polishing a sapphire substrate, as abrasive grains, and can combine high polishing speed and excellent quality of polished surface, and to provide a polishing method.SOLUTION: An abrasive material for polishing the polished surface of a sapphire substrate contains 1-15 mass% of silicon oxide particles for the total amount of the abrasive material, a polymer compound having a sulfo group and/or its salt and containing an aromatic ring, and water. A method for supplying the abrasive material to a polishing pad, bringing the polishing pad into contact with the polished surface of a sapphire substrate, and then polishing sapphire substrate by relative motion therebetween is also provided. |
