| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive negative-type resin composition which shows an excellent sensitive accuracy and an excellent sensitivity when a photolithographic method is used.SOLUTION: A photosensitive negative-type resin composition comprises (a) a compound having an epoxy group, (b) a first onium salt containing a cationic part structure of formula (b1) and an anionic part structure of formula (b2), and (c) a second onium salt containing a cationic part structure of formula (c1) and an anionic part structure of formula (c2). |
