| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for forming a silicon substrate texture in which strict management of liquid composition is not required, and optical reflectance is reduced while having a surface unevenness form of reduced unevenness.SOLUTION: A composition for forming a texture contains water and base, and further contains more than one kind of aminoalcohol compound represented by following formula (1). (In the formula, R, and Rare a hydrogen atom, an alkyl radical of 1C-12C, or an aryl group of 6C-18C, respectively and independently, and Ris an alkylene group of 2C-6C. m is an integer of 1-4, a is 0 or 1, b is 0 or 1, c is an integer of 1-3, a+b+c=3, and if c is 2 or more, a group represented by -(RO)m-H may be a group independent from each other). |
