| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive coloring composition which has good developability and image/line formability, does not cause residual coloring composition (development residue) in non-pixel areas on a substrate or pattern chipping after development, and is suitable as a highly productive color filter material, and to provide a color filter produced using the same.SOLUTION: A photosensitive coloring composition for a color filter contains a colorant, a binder resin, a photopolymerization initiator, and a photopolymerizable monomer, where the colorant contains a naphthol-azo pigment [A] represented by a general formula (1) below, and the photopolymerizable monomer contains a polyfunctional monomer having an acid group. |
