发明名称 AQUEOUS ETCHING AGENT COMPOSITIONS CONTAINING STRONG OXIDE PRECURSOR, THE STRUCTURE THEREOF AND METHODS FOR FORMING CONDUCTIVE CIRCUIT PATTERNINGS
摘要 The present invention relates to am aqueous etching agent composition containing a kind of strong acid precursors, a structure thereof, and a method for forming a conductive circuit patter. The present invention omits a material process such as photoresist and a photoresist remover drastically compared to an expensive photo etching process, thereby improving manufacturing efficiency and lowering manufacturing costs.
申请公布号 KR20140124331(A) 申请公布日期 2014.10.24
申请号 KR20140044171 申请日期 2014.04.14
申请人 POLYCHEM UV 发明人 YANG YUNG SHU;HAN CHUN CHIEH
分类号 C09K13/00 主分类号 C09K13/00
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