LIQUID PROCESSING DEVICE, LIQUID PROCESSING METHOD, AND MEASURING TOOL

摘要

PROBLEM TO BE SOLVED: To provide a technique capable of safely measuring a discharge rate of a process liquid to a substrate in a liquid processing device which discharges the process liquid to the substrate and processes the liquid.SOLUTION: A liquid processing device is configured to comprise: a substrate holding part which holds a substrate; a process liquid discharge unit which discharges a process liquid to a surface of the substrate held in the substrate holding part and processes the liquid; an imaging unit which images a recess in which the process liquid discharged from the process liquid discharge unit to check a discharge rate of the process liquid to the substrate is stored so that the discharge rate becomes a preset amount, and acquires image data; and a data processing unit which measures the amount of process liquid stored in the recess on the basis of the image data. This configuration eliminates the need that an operator enters the device.