发明名称 |
DRYER AND DRY PROCESSING METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a dryer which efficiently eliminates a solvent in an organic material film applied to a substrate in a short time and enables uniform dry processing on a surface of the substrate, and to provide a dry processing method.SOLUTION: A dryer 100 includes: a processing container 1 which enables vacuum drawing; a placement base 3 which serves as a support member for supporting a substrate S in the processing container 1; a gas jet device 5 which jets a gas to an organic material film on the substrate S supported by the placement base 3; and a control section 6. The dryer 100 includes a pressure control mechanism for controlling a pressure in the processing container 1. Multiple nozzles 51 are formed so that a user is able to adjust a gas jet flow rate and a type of the gas for each nozzle 51.</p> |
申请公布号 |
JP2014199805(A) |
申请公布日期 |
2014.10.23 |
申请号 |
JP20140016006 |
申请日期 |
2014.01.30 |
申请人 |
TOKYO ELECTRON LTD;SEIKO EPSON CORP |
发明人 |
SHIMAMURA AKINORI;HAYASHI TERUYUKI;IMADA YU;SADA TETSUYA;NISHIYAMA JUN;SAITO HIROMI;OTA TSUKASA;TANABE SEIICHI |
分类号 |
H05B33/10;B05D3/04;F26B3/04;F26B5/04;H01L51/50 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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