发明名称 POLISHING FILM
摘要 The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO2 are less apt to adhere to the polished surface, e.g., the polished surface of an end of an optical fiber itself, and which is less apt to cause the optical loss attributable to scratches or edge chips in the polished surface. The polishing film hence renders good finish-polishing quality possible. This polishing film is characterized by comprising a substrate and an abrasive layer which has been disposed on a surface of the substrate and which comprises abrasive particles comprising SiO2, a binder resin, and an adhesion inhibitor containing a phosphorus compound.
申请公布号 US2014311044(A1) 申请公布日期 2014.10.23
申请号 US201214238324 申请日期 2012.04.18
申请人 Taura Toshikazu;Saito Kazuo;Mukai Fumihiro 发明人 Taura Toshikazu;Saito Kazuo;Mukai Fumihiro
分类号 B24D3/28 主分类号 B24D3/28
代理机构 代理人
主权项 1. A polishing film at least comprising: a substrate, and an abrasive layer that is arranged on a surface of the substrate, and that has abrasive particles containing SiO2, a binder resin, and an anti-adhesive agent containing a phosphorus compound.
地址 Kobe-shi JP