发明名称 MATERIAL FEEDER FOR ELECTRON BEAM VAPOR DEPOSITION
摘要 <p>PROBLEM TO BE SOLVED: To prevent wetting-up and spreading of a vapor deposition material out of a material container and suppress variation of the film deposition rate.SOLUTION: In the upper end part of a material container (hearth liner 6A), there is provided an inner-diameter protrusion part 14A which is composed of a material of low wettability, protrudes toward the opening center of the material container and has one or both of a downgrade inclined part 14a and a downward step part 14b toward the opening center, and a vapor deposition material supply part (guide 13) which guides a vapor deposition material from the obliquely upper side of the material container to the inner-diameter protrusion part 14A is also provided. Wetting-up and spreading of a vapor deposition material out of a material container is prevented and variation of the film deposition rate is suppressed.</p>
申请公布号 JP2014198860(A) 申请公布日期 2014.10.23
申请号 JP20130073738 申请日期 2013.03.29
申请人 HITACHI ZOSEN CORP 发明人 YAMANARI JUNICHI;SHIMIZU YUSUKE
分类号 C23C14/30 主分类号 C23C14/30
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