发明名称 Semiconductor Device And Method For Manufacturing The Same
摘要 An object is to provide a thin film transistor having favorable electric characteristics and a semiconductor device including the thin film transistor as a switching element. The thin film transistor includes a gate electrode formed over an insulating surface, a gate insulating film over the gate electrode, an oxide semiconductor film which overlaps with the gate electrode over the gate insulating film and which includes a layer where the concentration of one or a plurality of metals contained in the oxide semiconductor is higher than that in other regions, a pair of metal oxide films formed over the oxide semiconductor film and in contact with the layer, and a source electrode and a drain electrode in contact with the metal oxide films. The metal oxide films are formed by oxidation of a metal contained in the source electrode and the drain electrode.
申请公布号 US2014312345(A1) 申请公布日期 2014.10.23
申请号 US201414320742 申请日期 2014.07.01
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 Miyanaga Akiharu;Sakata Junichiro;Sakakura Masayuki;Takahashi Masahiro;Kishida Hideyuki;Yamazaki Shunpei
分类号 H01L27/12 主分类号 H01L27/12
代理机构 代理人
主权项 1. (canceled)
地址 Atsugi-shi JP