发明名称 SAMPLE POSITIONING APPARATUS, SAMPLE STAGE, AND CHARGED PARTICLE BEAM APPARATUS
摘要 Provided is a sample positioning technology wherein micro-vibrations of a top table on which a sample is placed are suppressed such that the quality of an image to be observed or the precision of a measured dimension value can be improved. A sample positioning apparatus according to the present invention is provided with an active brake for stopping the top table, an inner frame which surrounds the active brake, an outer frame which surrounds the inner frame, and actuators for driving the active brake. The actuators, after driving the active brake to stop the top table with respect to a stage, press the outer frame to adjust the position of the top table.
申请公布号 US2014312246(A1) 申请公布日期 2014.10.23
申请号 US201214356566 申请日期 2012.11.08
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 Takahashi Motohiro;Ogawa Hironori;Shibata Nobuo;Mizuochi Masaki;Nakagawa Shuichi;Tsuji Hiroshi
分类号 H01J37/20 主分类号 H01J37/20
代理机构 代理人
主权项 1. A sample positioning apparatus that positions a sample with respect to a stage, comprising: a top table on which the sample is placed; an active brake that is disposed under the top table and that generates a reactive force in a direction in which the top table moves with respect to the stage to stop the top table; an inner frame that is disposed under the top table and that surrounds the active brake; an outer frame that is disposed under the top table and that surrounds the inner frame; and an actuator that is disposed between the inner frame and the outer frame and that drives the active brake, wherein the active brake is fixed to the inner frame and the top table is fixed to the outer frame, and wherein the actuator, after driving the active brake to stop the top table with respect to the stage, presses the outer frame to adjust a position of the top table.
地址 Tokyo JP