RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, COMPOUND, AND PRODUCTION METHOD OF THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in EL (exposure latitude) performance, LWR (line width roughness) performance, CDU (critical dimension uniformity) performance and top-loss suppressing property.SOLUTION: The radiation-sensitive resin composition comprises [A] a polymer having a structural unit (I) expressed by formula (1) shown below and [B] a radiation-sensitive acid generator. In formula (1), Rto Reach independently represent a hydrogen atom, a monovalent linear hydrocarbon group having 1 to 6 carbon atoms or a monovalent alicyclic hydrocarbon group having 3 to 15 carbon atoms, or two or more groups in Rto Rare bonded to each other to constitute an alicyclic structure having 3 to 20 carbon atoms together with carbon atoms bonded to these groups.