| 摘要 |
<p>PURPOSE: A crystalline alloy having glass forming ability, a method of fabricating the same, an alloy target for a sputtering, and a method of fabricating the same are provided to make a small composition deviation between a thin film composition and a target composition caused by a sputtering yield difference of a multi-component which comprises a target by having a very even micro-structure. CONSTITUTION: A crystalline alloy having glass forming ability comprises an alloy consisting of over 3 elements having glass forming ability. A mean size of a crystal grain of an alloy is in 0.1 to 5μm range. The alloy comprises Al of 5 to 20 atomic%, and one selected between Cu and Ni of 15 to 40 atomic%, and a residue comprises Zr. An alloy having glass forming ability obtains an amorphous ribbon with a casting thickness in 20 to 100μm range when casting a molten metal of the alloy at a cooling speed in 10^4-10^6 K/sec range.</p> |
