APPARATUS AND METHODS FOR PERFORMING WAVEFRONT-BASED AND PROFILE-BASED MEASUREMENTS OF AN ASPHERIC SURFACE

摘要

Apparatus and methods for performing wavefront-based and profile-based measurements of an aspheric surface are disclosed. The apparatus includes an interferometric wavefront measurement system that collects wavefront-based measurement data of the aspheric surface. The apparatus also includes a profile measurement system that performs at least one non-contact profile-based measurement of the aspheric surface to collect profile-based measurement data of the aspheric surface. The measurements are performed without removing the aspheric element from a rotatable base. The two measurements are then used to form a combined measurement of the aspheric surface.

主权项

1. An apparatus for measuring a shape of an aspheric surface of an aspheric element, comprising:
a support structure; a moveable stage moveably attached to the support structure; a rotatable base disposed on the movable stage and adapted to rotatably support the aspheric element along an apparatus axis; an interferometric wavefront measurement system operably supported by the support structure and adapted to optically interrogate the aspheric surface with a measurement wavefront to collect wavefront-based measurement data of the aspheric surface; a profile measurement system operably supported by the support structure and adapted to perform at least one non-contact profile-based measurement of the aspheric surface to collect profile-based measurement data of the aspheric surface; and a controller adapted to receive and process the wavefront-based measurement data and the profile-based measurement data to define a combined measurement of the aspheric surface.