发明名称 NON-VOLATILE MEMORY CELL WITH SELF ALIGNED FLOATING AND ERASE GATES, AND METHOD OF MAKING SAME
摘要 A memory device, and method of making the same, in which a trench is formed into a substrate of semiconductor material. The source region is formed under the trench, and the channel region between the source and drain regions includes a first portion that extends substantially along a sidewall of the trench and a second portion that extends substantially along the surface of the substrate. The floating gate is disposed in the trench, and is insulated from the channel region first portion for controlling its conductivity. A control gate is disposed over and insulated from the channel region second portion, for controlling its conductivity. An erase gate is disposed at least partially over and insulated from the floating gate. An electrically conductive coupling gate is disposed in the trench, adjacent to and insulated from the floating gate, and over and insulated from the source region.
申请公布号 WO2014172433(A1) 申请公布日期 2014.10.23
申请号 WO2014US34318 申请日期 2014.04.16
申请人 SILICON STORAGE TECHNOLOGY, INC. 发明人 DO, NHAN;KIM, JINHO;LIU, XIAN
分类号 H01L29/423;H01L27/115;H01L29/66;H01L29/788 主分类号 H01L29/423
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