| 发明名称 |
IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD |
| 摘要 |
Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween. |
| 申请公布号 |
US2014312532(A1) |
申请公布日期 |
2014.10.23 |
| 申请号 |
US201414254364 |
申请日期 |
2014.04.16 |
| 申请人 |
CANON KABUSHIKI KAISHA ;Molecular Imprints, Inc. |
发明人 |
Mizuno Makoto;Arai Tsuyoshi;Takabayashi Yukio;Shackleton Steven C.;Choi Byung-Jin |
| 分类号 |
B29C43/20 |
主分类号 |
B29C43/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An imprint apparatus, which imprints a pattern formed in a mold onto a substrate, comprising:
a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween. |
| 地址 |
Tokyo JP |
