发明名称 PRESSURE CONTROLLER CONFIGURATION FOR SEMICONDUCTOR PROCESSING APPLICATIONS
摘要 <p>An exemplary semiconductor processing system may include a processing chamber and a first pressure regulating device coupled with the processing chamber. A second pressure regulating device may also be coupled with the processing chamber separate from the first pressure regulating device. A first pump may be fluidly coupled with the first pressure regulating device and fluidly isolated from the second pressure regulating device. A second fluid pump may be fluidly coupled with the second pressure regulating device.</p>
申请公布号 WO2014172142(A1) 申请公布日期 2014.10.23
申请号 WO2014US33263 申请日期 2014.04.08
申请人 APPLIED MATERIALS, INC 发明人 BELOSTOTSKIY, SERGEY G.;NGUYEN, ANDREW;DINH, JONATHAN;LIN, YING-SHENG
分类号 H01L21/02 主分类号 H01L21/02
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