发明名称 |
PRESSURE CONTROLLER CONFIGURATION FOR SEMICONDUCTOR PROCESSING APPLICATIONS |
摘要 |
<p>An exemplary semiconductor processing system may include a processing chamber and a first pressure regulating device coupled with the processing chamber. A second pressure regulating device may also be coupled with the processing chamber separate from the first pressure regulating device. A first pump may be fluidly coupled with the first pressure regulating device and fluidly isolated from the second pressure regulating device. A second fluid pump may be fluidly coupled with the second pressure regulating device.</p> |
申请公布号 |
WO2014172142(A1) |
申请公布日期 |
2014.10.23 |
申请号 |
WO2014US33263 |
申请日期 |
2014.04.08 |
申请人 |
APPLIED MATERIALS, INC |
发明人 |
BELOSTOTSKIY, SERGEY G.;NGUYEN, ANDREW;DINH, JONATHAN;LIN, YING-SHENG |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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