| 发明名称 |
DEVELOPER AND PATTERNING PROCESS |
| 摘要 |
An aqueous solution containing 0.1-20 wt % of a benzyltrialkylammonium hydroxide is a useful developer for photosensitive resist materials. When an exposed resist film is developed in the developer, any swell of the resist film during development is suppressed. A resist pattern with minimal edge roughness can be formed while preventing pattern collapse or bridge defect formation. |
| 申请公布号 |
US2014315131(A1) |
申请公布日期 |
2014.10.23 |
| 申请号 |
US201414193193 |
申请日期 |
2014.02.28 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
Hatakeyama Jun |
| 分类号 |
G03F7/32 |
主分类号 |
G03F7/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A developer for photosensitive resist materials comprising an aqueous solution containing 0.1 to 20% by weight of a substituted or unsubstituted benzyltrialkylammonium hydroxide. |
| 地址 |
Tokyo JP |
