| 发明名称 |
OPTICAL ELEMENT AND PROJECTION EXPOSURE APPARATUS BASED ON USE OF THE OPTICAL ELEMENT |
| 摘要 |
An optical element for use in an exposure apparatus configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided directly on a surface of a transmissive optical element on the substrate's side of the projection optical system, and a second anti-dissolution member formed on the first anti-dissolution member on the substrate's side of the first anti-dissolution member. |
| 申请公布号 |
US2014313495(A1) |
申请公布日期 |
2014.10.23 |
| 申请号 |
US201414318958 |
申请日期 |
2014.06.30 |
| 申请人 |
NIKON CORPORATION |
发明人 |
SHIRAI Takeshi |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An optical element to be used for an exposure apparatus configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system, the optical element comprising:
a first anti-dissolution member provided directly on a surface of a transmissive optical element on the substrate's side of the projection optical system; and a second anti-dissolution member formed on the first anti-dissolution member on the substrate's side of the first anti-dissolution member. |
| 地址 |
Tokyo JP |
