发明名称 |
INTERFACE BETWEEN A I/III/VI2 LAYER AND A BACK CONTACT LAYER IN A PHOTOVOLTAIC CELL |
摘要 |
The invention relates to a method of manufacturing a I-III-VI2 layer with photovoltaic properties, comprising:
deposition of a metal on a substrate to form a contact layer,deposition of a precursor of the photovoltaic layer, on the contact layer, andheat treatment of the precursor with an addition of element VI to form the layer.;The element VI usually diffuses into the contact layer (MO) during the heat treatment and combines with the metal to form a superficial layer (SUP) on the contact layer. In the method of the invention, the metal deposition comprises a step during which an additional element is added to the metal to form a compound (MO-EA), in the contact layer, acting as a barrier to the diffusion of the element VI, which allows precisely controlling the properties of the superficial layer, particularly its thickness. |
申请公布号 |
US2014315346(A1) |
申请公布日期 |
2014.10.23 |
申请号 |
US201214358185 |
申请日期 |
2012.11.22 |
申请人 |
NEXCIS |
发明人 |
Angle Stephanie;Parissi Ludovic |
分类号 |
H01L31/18;H01L31/032 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
1. Method for fabricating a I-III-VI2 layer having photovoltaic properties, comprising:
deposition of a metal on a substrate to form a contact layer, deposition of a precursor of the photovoltaic layer, on the contact layer, and heat treatment of the precursor with an addition of element VI to form the I-III-VI2 layer, the element VI diffusing into the contact layer during the heat treatment and combining with the metal to form a superficial layer (SUP) on the contact layer, said method being characterized by the metal deposition comprising a step during which an additional element is added to the metal to form a compound (MO-EA), in the contact layer, acting as a barrier to the diffusion of the element VI. |
地址 |
Rousset FR |