发明名称 INTERFACE BETWEEN A I/III/VI2 LAYER AND A BACK CONTACT LAYER IN A PHOTOVOLTAIC CELL
摘要 The invention relates to a method of manufacturing a I-III-VI2 layer with photovoltaic properties, comprising: deposition of a metal on a substrate to form a contact layer,deposition of a precursor of the photovoltaic layer, on the contact layer, andheat treatment of the precursor with an addition of element VI to form the layer.;The element VI usually diffuses into the contact layer (MO) during the heat treatment and combines with the metal to form a superficial layer (SUP) on the contact layer. In the method of the invention, the metal deposition comprises a step during which an additional element is added to the metal to form a compound (MO-EA), in the contact layer, acting as a barrier to the diffusion of the element VI, which allows precisely controlling the properties of the superficial layer, particularly its thickness.
申请公布号 US2014315346(A1) 申请公布日期 2014.10.23
申请号 US201214358185 申请日期 2012.11.22
申请人 NEXCIS 发明人 Angle Stephanie;Parissi Ludovic
分类号 H01L31/18;H01L31/032 主分类号 H01L31/18
代理机构 代理人
主权项 1. Method for fabricating a I-III-VI2 layer having photovoltaic properties, comprising: deposition of a metal on a substrate to form a contact layer, deposition of a precursor of the photovoltaic layer, on the contact layer, and heat treatment of the precursor with an addition of element VI to form the I-III-VI2 layer, the element VI diffusing into the contact layer during the heat treatment and combining with the metal to form a superficial layer (SUP) on the contact layer, said method being characterized by the metal deposition comprising a step during which an additional element is added to the metal to form a compound (MO-EA), in the contact layer, acting as a barrier to the diffusion of the element VI.
地址 Rousset FR