| 摘要 |
PROBLEM TO BE SOLVED: To cover the entire surface of a substrate with a process liquid while reducing the supply amount of the process liquid.SOLUTION: A substrate liquid processing method includes the steps of: supplying a process liquid through a first nozzle (30) to the center of a surface of a substrate (W) while rotating the substrate around a vertical axis line in a horizontal posture, and forming a liquid film of the process liquid on the surface of the substrate, the liquid film having a diameter smaller than that of the substrate; supplying a process liquid, which is the same with the process liquid supplied through the first nozzle, through a second nozzle (33) to a peripheral part of the liquid film of the process liquid having been formed on the surface of the substrate through the first nozzle; and thereafter moving the supply position of the process liquid supplied through the second nozzle to the surface of the substrate toward a peripheral part of the substrate, thereby expanding the liquid film of the process liquid toward the peripheral part of the substrate. |
