发明名称 POWER DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 Provided are a power device having an improved field stop layer and a method of manufacturing the same. The power device includes: a first field stop layer formed of a semiconductor substrate and of a first conductive type; a second field stop layer formed on the first field stop layer and of the first conductive type, the second field stop layer having a region with an impurity concentration higher than the first field stop layer; a drift region formed on the second field stop layer and of the first conductive type, the drift region having an impurity concentration lower than the first field stop layer; a plurality of power device cells formed on the drift region; and a collector region formed below the first field stop layer, wherein the second field stop layer includes a first region having a first impurity concentration and a second region having a second impurity concentration higher than the first impurity concentration.
申请公布号 US2014312382(A1) 申请公布日期 2014.10.23
申请号 US201414316248 申请日期 2014.06.26
申请人 FAIRCHILD KOREA SEMICONDUCTOR LTD. 发明人 LEE Kyu-hyun;KIM Young-chul;PARK Kyeong-seok;LEE Bong-yong;CHOI Young-chul
分类号 H01L29/739;H01L21/266;H01L29/66 主分类号 H01L29/739
代理机构 代理人
主权项 1. A power device comprising: a first field stop layer of a first conductive type; a second field stop layer formed on the first field stop layer and of the first conductive type, the second field stop layer having a region with an impurity concentration higher than the first field stop layer; a drift region formed on the second field stop layer and of the first conductive type, the drift region having an impurity concentration lower than the first field stop layer; a plurality of power device cells formed on the drift region; and a collector region formed below the first field stop layer, wherein the second field stop layer including a first region having a first impurity concentration and a second region having a second impurity concentration higher than the first impurity concentration.
地址 Bucheon-si KR