发明名称 露光装置、露光方法、及びデバイス製造方法
摘要 <p><P>PROBLEM TO BE SOLVED: To detect the position of a substrate easily. <P>SOLUTION: The exposure device EX comprises an exposure unit which exposes a substrate P to be exposed with a circuit pattern, and an alignment system 4 provided to penetrate the substrate P and to detect the position of the substrate P by passing light through an alignment mark AM becoming a position reference of exposure. The alignment system 4 may comprise an optical member which emits light, and a reflection portion which reflects light emitted from the optical member and passed through the alignment mark AM. <P>COPYRIGHT: (C)2012,JPO&INPIT</p>
申请公布号 JP5609513(B2) 申请公布日期 2014.10.22
申请号 JP20100225759 申请日期 2010.10.05
申请人 发明人
分类号 H01L21/027;G03F9/00;H01L21/68 主分类号 H01L21/027
代理机构 代理人
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