发明名称 |
HEATER AND SUBSTRATE PROCESSING APPARATUS USING THE SAME |
摘要 |
Disclosed are a heater and an apparatus for processing a substrate using the same. According to the present invention, a support member, which supports a case and a cover plate, is formed between the case and the cover plate of the heater. Therefore, the support member enhances heat resistance of the heater, thereby preventing deformation of the heater at high temperature. |
申请公布号 |
KR101452335(B1) |
申请公布日期 |
2014.10.22 |
申请号 |
KR20130067232 |
申请日期 |
2013.06.12 |
申请人 |
TERASEMICON CORPORATION |
发明人 |
LEE, TAE WAN;CHO, BYUNG HO;KANG, HO YOUNG;PARK, KYOUNG WAN;SEOL, JUN HO |
分类号 |
H01L21/00;H05B3/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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