发明名称 |
DISSOLVED NITROGEN CONCENTRATION MONITORING METHOD AND SUBSTRATE CLEANING METHOD |
摘要 |
<p>A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.</p> |
申请公布号 |
EP2656064(B1) |
申请公布日期 |
2014.10.22 |
申请号 |
EP20110805808 |
申请日期 |
2011.12.13 |
申请人 |
SILTRONIC AG |
发明人 |
HAIBARA, TERUO;KUBO, ETSUKO;MORI, YOSHIHIRO;UCHIBE, MASASHI |
分类号 |
G01N33/18;B08B3/12;H01L21/02;H01L21/67 |
主分类号 |
G01N33/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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