发明名称 DISSOLVED NITROGEN CONCENTRATION MONITORING METHOD AND SUBSTRATE CLEANING METHOD
摘要 <p>A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.</p>
申请公布号 EP2656064(B1) 申请公布日期 2014.10.22
申请号 EP20110805808 申请日期 2011.12.13
申请人 SILTRONIC AG 发明人 HAIBARA, TERUO;KUBO, ETSUKO;MORI, YOSHIHIRO;UCHIBE, MASASHI
分类号 G01N33/18;B08B3/12;H01L21/02;H01L21/67 主分类号 G01N33/18
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