发明名称 シンチレータの製造方法
摘要 <p>A process for producing a scintillator including the steps of producing a CsI columnar film formed of columnar CsI crystals by a deposition method, and adding an emission center to the CsI columnar film by disposing the CsI columnar film and an emission center material in a non-contact state in a closed space, heating the CsI columnar film in the range of not less than a sublimation temperature or evaporation temperature of the emission center material and not more than a temperature at which a columnar shape of the CsI columnar film can be maintained, and heating the emission center material at a temperature of not less than a sublimation temperature or evaporation temperature thereof.</p>
申请公布号 JP5610798(B2) 申请公布日期 2014.10.22
申请号 JP20100056616 申请日期 2010.03.12
申请人 发明人
分类号 G21K4/00;C09K11/55;C23C14/24;C23C14/58;C30B23/06;C30B29/62;C30B31/08 主分类号 G21K4/00
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