| 摘要 |
The present invention relates to a method for manufacturing a laminate including an organic layer, which prevents damages on the organic layer and effectively and precisely forms a metal layer patterned on the organic layer and a resist composition for electron beam lithography used therefor. The method for manufacturing a laminate including an organic layer comprises the steps of: forming a first resist layer on an organic layer using a material which does not react with the organic layer and is developed and lifted off by inorganic solvents; patterning the first resist layer in order for a part of the upper surface of the organic layer to be exposed; forming a metal layer on at least a part of the exposed upper surface of the organic layer; and removing the first resist layer. |
