| 摘要 |
The disclosed technology provides a method of manufacturing a color filter substrate, comprising: preparing a transparent base substrate (1), the transparent base substrate (1) having a first principal surface (10) and a second principal surface (20) opposite to the first principal surface (10); forming a color film on the first principal surface (10) of the transparent base substrate (1), performing an exposure on the color film by illuminating light from the second principal surface (20) side of the transparent base substrate (1), and etching the exposed color film to form a plurality of color film patterns (2), the plurality of color film patterns (2) having intervals (6) therebetween; and forming a black matrix (3) in the intervals (6) between the plurality of color film patterns (2) so that the black matrix (3) fully fills the intervals (6) between the plurality of color film patterns (2). The disclosed technology also provides a color filter substrate. |
