Method and apparatus for aligning a mask with the visual axis of an eye

摘要

A method is provided for increasing the depth of focus of an eye of a patient. A visual axis of the eye is aligned with an instrument axis of an ophthalmic instrument. The ophthalmic instrument has an aperture through which the patient may look along the instrument axis. A first reference target is imaged on the instrument axis at a first distance with respect to the eye. A second reference target is imaged on the instrument axis with the ophthalmic instrument at a second distance with respect to the eye. The second distance is greater than the first distance. Movement is provided such that the patient's eye is in a position where the images of the first and second reference targets appear to the patient's eye to be aligned. A mask comprising a pin-hole aperture having a mask axis is aligned with the instrument axis such that the mask axis and the instrument axis are substantially collinear. The mask is applied to the eye of the patient while the alignment of the mask axis and the instrument axis is maintained. Maintaining alignment of the mask axis and the instrument axis may be facilitated by capturing an image of the eye.

主权项

1. A method for correcting vision of an eye of a patient, the method comprising:
performing a surgical procedure on the eye; and applying a mask to the eye between a first layer and a second layer of a cornea of the eye, wherein the mask is configured to increase the depth of focus of the patient, the mask comprising an aperture configured to transmit light, a portion configured to be substantially opaque to visible light and to surround at least a portion of the aperture, and a plurality of holes in the substantially opaque portion configured to reduce visible diffraction patterns from visible light that passes through the holes by having irregular locations in the opaque annulus, wherein the plurality of holes comprise a first plurality of the holes having a first hole size, shape, or spacing and a second plurality of the holes having a second hole size, shape, or spacing different from the first hole size, shape, or spacing, and wherein the opaque portion further comprises a central region, an inner peripheral region between the central region and the aperture, and an outer peripheral region between the central region and an outer edge of the mask, the central, inner, and outer regions having holes, at least one of the inner and outer regions having a lower density of holes than the central region.