发明名称 Nanolaminated coated cutting tool
摘要 A cutting tool insert for machining by chip removal includes a body of polycrystalline cubic boron nitride compact (PCBN), either as a solid insert or attached to a backing body, onto which a hard and wear resistant PVD coating is deposited. The coating includes a polycrystalline nanolaminated structure of alternating A and B layers, where layer A is (Ti,Al,Me1)N and Me1 is one or more of the metal elements from group 3, 4, 5 or 6 in the periodic table, layer B is (Ti,Si,Me2)N and Me2 is one or more of the metal elements from group 3, 4, 5 or 6 in the periodic table including Al with a thickness between 0.5 and 10 μm. The insert is particularly useful in metal cutting applications generating high temperatures, e.g., high speed machining of steels, cast irons, super alloys and hardened steels.
申请公布号 US8864861(B2) 申请公布日期 2014.10.21
申请号 US201013375602 申请日期 2010.05.28
申请人 Seco Tools AB 发明人 Andersson Jon;M'Saoubi Rachid;Larsson Tommy;Johansson Mats;Alm Per
分类号 C23C14/00;C04B41/89;C04B41/00;C04B41/52;C23C14/06;C23C30/00 主分类号 C23C14/00
代理机构 Young & Thompson 代理人 Young & Thompson
主权项 1. A cutting tool insert for machining by chip removal, comprising: a body, either as a solid insert or attached to a backing body; and a hard and wear resistant PVD coating, wherein said body is a polycrystalline cubic boron nitride compact (PCBN) containing at least 30 vol % of cubic phase boron nitride (cBN) in a binder comprising at least one compound selected from nitrides, borides, oxides, carbides and carbonitrides of one or more of the elements belonging to the groups 4, 5 and 6 of the periodic table and Al, and said coating comprises a columnar and polycrystalline nanolaminated structure of alternating A and B layers, where layer A is (Ti1-xAlxMe1p)Na, with 0.3<x<0.95, 0.90<a<1.10, 0≦p<0.15, and Me1 is one or more of Zr, Y, V, Nb, Mo and W, layer B is (Ti1-y-zSiyMe2z)Nb, with 0.05<y<0.25, 0≦z<0.4, 0.9<b<1.1 and Me2 is one or more of Y, V, Nb, Mo, W and Al, with a thickness of the nanolaminated structure between 0.5 and 10 μm, an average column width between 20 and 1000 nm, and an average individual thickness of A and B layers between 1 and 50 nm.
地址 Fagersta SE