发明名称 Method for making epitaxial structure
摘要 A method for making epitaxial structure is provided. The method includes providing a substrate having an epitaxial growth surface, growing a buffer layer on the epitaxial growth surface; placing a graphene layer on the buffer layer; epitaxially growing an epitaxial layer on the buffer layer; and removing the substrate. The graphene layer includes a number of apertures to expose a part of the buffer layer. The epitaxial layer is grown from the exposed part of the buffer layer and through the apertures.
申请公布号 US8865577(B2) 申请公布日期 2014.10.21
申请号 US201213676033 申请日期 2012.11.13
申请人 Tsinghua University;Hon Hai Precision Industry Co., Ltd. 发明人 Wei Yang;Fan Shou-Shan
分类号 H01L21/20 主分类号 H01L21/20
代理机构 Novak Druce Connolly Bove + Quigg LLP 代理人 Novak Druce Connolly Bove + Quigg LLP
主权项 1. A method for making an epitaxial structure, the method comprising: growing a buffer layer on an epitaxial growth surface of a substrate; fabricating a continuous graphene layer on the buffer layer; obtaining a patterned graphene layer by patterning the continuous graphene layer, wherein the patterning the continuous graphene layer comprises: making a patterned metal titanium layer by depositing metal titanium on a patterned carbon nanotube structure;forming a patterned titanium dioxide layer by oxidizing the patterned metal titanium layer;contacting the patterned titanium dioxide layer with the continuous graphene layer;irradiating the patterned titanium dioxide layer with ultraviolet light; andremoving the patterned titanium dioxide layer; epitaxially growing an epitaxial layer on the buffer layer to obtain an epitaxial structure preform; and removing the substrate.
地址 Beijing CN