发明名称 |
Method for making epitaxial structure |
摘要 |
A method for making epitaxial structure is provided. The method includes providing a substrate having an epitaxial growth surface, growing a buffer layer on the epitaxial growth surface; placing a graphene layer on the buffer layer; epitaxially growing an epitaxial layer on the buffer layer; and removing the substrate. The graphene layer includes a number of apertures to expose a part of the buffer layer. The epitaxial layer is grown from the exposed part of the buffer layer and through the apertures. |
申请公布号 |
US8865577(B2) |
申请公布日期 |
2014.10.21 |
申请号 |
US201213676033 |
申请日期 |
2012.11.13 |
申请人 |
Tsinghua University;Hon Hai Precision Industry Co., Ltd. |
发明人 |
Wei Yang;Fan Shou-Shan |
分类号 |
H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
Novak Druce Connolly Bove + Quigg LLP |
代理人 |
Novak Druce Connolly Bove + Quigg LLP |
主权项 |
1. A method for making an epitaxial structure, the method comprising:
growing a buffer layer on an epitaxial growth surface of a substrate; fabricating a continuous graphene layer on the buffer layer; obtaining a patterned graphene layer by patterning the continuous graphene layer, wherein the patterning the continuous graphene layer comprises:
making a patterned metal titanium layer by depositing metal titanium on a patterned carbon nanotube structure;forming a patterned titanium dioxide layer by oxidizing the patterned metal titanium layer;contacting the patterned titanium dioxide layer with the continuous graphene layer;irradiating the patterned titanium dioxide layer with ultraviolet light; andremoving the patterned titanium dioxide layer; epitaxially growing an epitaxial layer on the buffer layer to obtain an epitaxial structure preform; and removing the substrate. |
地址 |
Beijing CN |