发明名称 Silicon surface texturing method for reducing surface reflectance
摘要 A method of texturing a surface of a crystalline silicon substrate is provided. The method includes immersing a crystalline silicon substrate into an aqueous alkaline etchant solution to form a pyramid shaped textured surface, with (111) faces exposed, on the crystalline silicon substrate. The aqueous alkaline etchant solution employed in the method of the present disclosure includes an alkaline component and a nanoparticle slurry component. Specifically, the aqueous alkaline etchant solution of the present disclosure includes 0.5 weight percent to 5 weight percent of an alkaline component and from 0.1 weight percent to 5 weight percent of a nanoparticle slurry on a dry basis.
申请公布号 US8865017(B2) 申请公布日期 2014.10.21
申请号 US201314060107 申请日期 2013.10.22
申请人 International Business Machines Corporation 发明人 Krishnan Mahadevaiyer;Liu Jun;Papa Rao Satyavolu S.;Totir George G.
分类号 C09K13/02;H01L31/18;H01L31/0236;H01L31/0384;B82Y30/00 主分类号 C09K13/02
代理机构 Scully, Scott, Murphy & Presser, P.C. 代理人 Scully, Scott, Murphy & Presser, P.C. ;Percello Louis J.
主权项 1. An aqueous alkaline etchant solution for texturing a surface of a crystalline silicon substrate, said aqueous alkaline etchant solution comprising 0.5 weight percent to 5 weight percent of an alkaline component, 0.1 weight percent to 5 weight percent of a nanoparticle slurry on a dry basis at least one alcohol and a surfactant, wherein said nanoparticle slurry consists of colloidal particles selected from the group consisting of alumina, ceria, berylia, magnesia, zirconia and titania.
地址 Armonk NY US