| 主权项 |
1. A method for manufacturing an active device array substrate, the method comprising acts of:
providing a flexible substrate having at least one transistor region and at least one transparent region; forming a gate electrode on the transistor region of the flexible substrate; sequentially forming a dielectric layer and a semiconductor layer to cover the gate electrode and the flexible substrate; removing a part of the semiconductor layer to form a channel layer above the gate electrode and removing a thickness of the dielectric layer which is disposed on the transparent region of the flexible substrate, such that a portion of the dielectric layer on the gate electrode has a first thickness, and another portion of the dielectric layer on the transparent region of the flexible substrate has a second thickness, wherein the second thickness is less than the first thickness; respectively forming a source electrode and a drain electrode on opposite sides of the channel layer, the source electrode and the drain electrode electrically connected to the channel layer; forming a passivation layer to cover the channel layer, the source electrode, the drain electrode, and the dielectric layer; forming a transistor contact hole in the passivation layer to expose the drain electrode and removing the passivation layer which is disposed on the transparent region to expose the dielectric layer which is disposed on the transparent region; and forming a pixel electrode on the dielectric layer which is disposed on the transparent region, the pixel electrode electrically connected to the drain electrode through the transistor contact hole. |
