发明名称 |
Solar cells with plated back side surface field and back side electrical contact and method of fabricating same |
摘要 |
The present disclosure provides a method of forming a back side surface field of a solar cell without utilizing screen printing. The method includes first forming a p-type dopant layer directly on the back side surface of the semiconductor substrate that includes a p/n junction utilizing an electrodeposition method. The p/n junction is defined as the interface that is formed between an n-type semiconductor portion of the substrate and an underlying p-type semiconductor portion of the substrate. The plated structure is then annealed to from a P++ back side surface field layer directly on the back side surface of the semiconductor substrate. Optionally, a metallic film can be electrodeposited on an exposed surface of the P++ back side surface layer. |
申请公布号 |
US8865502(B2) |
申请公布日期 |
2014.10.21 |
申请号 |
US201012813087 |
申请日期 |
2010.06.10 |
申请人 |
International Business Machines Corporation |
发明人 |
Fisher Kathryn C.;Fuller Nicholas C. M.;Papa Rao Satyavolu S.;Shao Xiaoyan;Hedrick Jeffrey |
分类号 |
H01L31/0236;H01L31/068;H01L31/0224;H01L31/18 |
主分类号 |
H01L31/0236 |
代理机构 |
Scully, Scott, Murphy & Presser, P.C. |
代理人 |
Scully, Scott, Murphy & Presser, P.C. ;Percello, Esq. Louis J. |
主权项 |
1. A method of fabricating a solar cell comprising:
providing a semiconductor substrate of a first thickness and comprising a single semiconductor material layer including a p-type semiconductor portion and an overlying n-type semiconductor portion, wherein an exposed surface of the p-type semiconductor portion defines a back side surface of the semiconductor substrate and wherein an exposed surface of the n-type semiconductor portion defines a front side surface; forming a p-type dopant layer directly on and in direct physical contact with said back side surface of said p-type semiconductor portion of said semiconductor substrate, wherein said p-type dopant layer is formed by electroplating at least one p-type dopant atom selected from the group consisting of boron, gallium and indium from an electroplating bath; and thermal annealing said semiconductor substrate and said p-type dopant layer to convert a portion of the p-type semiconductor portion of the semiconductor substrate into a P++ doped semiconductor back side surface field layer, wherein during said thermally annealing said p-type dopant layer is completely consumed and said semiconductor substrate has a second thickness that is greater than the first thickness. |
地址 |
Armonk NY US |