发明名称 Solar cells with plated back side surface field and back side electrical contact and method of fabricating same
摘要 The present disclosure provides a method of forming a back side surface field of a solar cell without utilizing screen printing. The method includes first forming a p-type dopant layer directly on the back side surface of the semiconductor substrate that includes a p/n junction utilizing an electrodeposition method. The p/n junction is defined as the interface that is formed between an n-type semiconductor portion of the substrate and an underlying p-type semiconductor portion of the substrate. The plated structure is then annealed to from a P++ back side surface field layer directly on the back side surface of the semiconductor substrate. Optionally, a metallic film can be electrodeposited on an exposed surface of the P++ back side surface layer.
申请公布号 US8865502(B2) 申请公布日期 2014.10.21
申请号 US201012813087 申请日期 2010.06.10
申请人 International Business Machines Corporation 发明人 Fisher Kathryn C.;Fuller Nicholas C. M.;Papa Rao Satyavolu S.;Shao Xiaoyan;Hedrick Jeffrey
分类号 H01L31/0236;H01L31/068;H01L31/0224;H01L31/18 主分类号 H01L31/0236
代理机构 Scully, Scott, Murphy & Presser, P.C. 代理人 Scully, Scott, Murphy & Presser, P.C. ;Percello, Esq. Louis J.
主权项 1. A method of fabricating a solar cell comprising: providing a semiconductor substrate of a first thickness and comprising a single semiconductor material layer including a p-type semiconductor portion and an overlying n-type semiconductor portion, wherein an exposed surface of the p-type semiconductor portion defines a back side surface of the semiconductor substrate and wherein an exposed surface of the n-type semiconductor portion defines a front side surface; forming a p-type dopant layer directly on and in direct physical contact with said back side surface of said p-type semiconductor portion of said semiconductor substrate, wherein said p-type dopant layer is formed by electroplating at least one p-type dopant atom selected from the group consisting of boron, gallium and indium from an electroplating bath; and thermal annealing said semiconductor substrate and said p-type dopant layer to convert a portion of the p-type semiconductor portion of the semiconductor substrate into a P++ doped semiconductor back side surface field layer, wherein during said thermally annealing said p-type dopant layer is completely consumed and said semiconductor substrate has a second thickness that is greater than the first thickness.
地址 Armonk NY US