Halftone phase shift blank photomasks and halftone phase shift photomasks

摘要

Halftone phase shift photomasks are provided including a substrate configured to transmit light; a shift pattern on the substrate, the shift pattern including a pattern area on a center portion of the substrate and a blind area disposed on a periphery of the substrate, the shift pattern of the blind area having a greater thickness than a thickness that of the pattern area, and being configured to partially transmit the light; and a light shielding pattern formed on the shift pattern in the blind area and being configured to shield the light. Related methods are also provided herein.

主权项

1. A halftone phase shift photomask, comprising:
a substrate configured to transmit light, the substrate having a pattern area disposed at a center of the substrate and a blind area at a periphery of the substrate; a shift pattern on the substrate, the shift pattern including a first shift pattern on the blind area and a second shift pattern on the pattern area the first shift pattern thicker than the second area, and being configured to partially transmit the light; and a light shielding pattern formed on the shift pattern in the blind area and being configured to shield the light, wherein the second shift pattern comprises a main portion and a sub-resolution assist feature (SRAF) portion, the SRAF portion being smaller than the main portion.